LEE, C.; RYU, S.; HWANG, T.; KIM, S.; KIM, Y.; PARK, J. Oxide Semiconductor for Advanced Memory Architectures: Atomic Layer Deposition, Key Requirement and Challenges. Nano-Micro Letters, [S. l.], v. 18, p. 180, 2026. DOI: 10.1007/s40820-025-02013-7. Disponível em: https://www.nmlett.org/index.php/nml/article/view/2288. Acesso em: 18 feb. 2026.