GUO, Q.; XU, Z.; YANG, L.; ZHANG, J.; GAN, Y.; ZHANG, J.; JIANG, J.; WANG, Y. Scalable and Sustainable Dry Microfabrication Enabled by High-Precision and Wafer-Scale Transfer Lithography of Commercial Photoresists. Nano-Micro Letters, [S. l.], v. 18, p. 357, 2026. DOI: 10.1007/s40820-026-02215-7. Disponível em: https://www.nmlett.org/index.php/nml/article/view/2503. Acesso em: 11 may. 2026.